Technology

High-power impulse magnetron sputtering (HiPIMS)

High-power impulse magnetron sputtering (HiPIMS) is an advanced thin-film deposition technique characterized by short pulses of high-power electrical discharges applied to a magnetron target. This approach generates highly ionized plasma, significantly enhancing coating adhesion, density, and overall quality compared to conventional sputtering techniques. By controlling pulse length, frequency, and power, HiPIMS enables precise tailoring of coating properties for many industrial applications.

Key features and benefits of HiPIMS

Limitations

• Generally lower deposition rates compared to traditional DC magnetron sputtering, which may increase processing time.
• Higher complexity and investment costs associated with specialized power supplies.